BS ISO 14237:2010

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

Published By	Publication Date	Number of Pages
BSI	2010	30

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Categories: 71.040.40 - Chemical analysis, BSI

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Description

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 10¹⁶ atoms/cm³ to 1 × 10²⁰ atoms/cm³.

Additional information

Status	Confirmed
Pages	30
Publication Date	2010-08-31
ISBN	978 0 580 57402 3
Standard Number	BS ISO 14237:2010
Title	Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Identical National Standard Of	ISO 14237:2010
Replaces	BS ISO 14237:2000
Descriptors	Surface properties, Ions, Specimen preparation, Concentration (chemical), Single, Control samples, Calibration, Doping agents, Secondary, Determination of content, Boron, Silicon, Isotopes, Homogeneity, Surface chemistry, Mathematical calculations, Performance testing, Semiconductor technology, Chemical analysis and testing, Statistical methods of analysis, Mass spectrometry, Spectroscopy, Crystals, Precision, Test equipment
Publisher	BSI
Committee	CII/60
ICS Codes	71.040.40 - Chemical analysis

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BS ISO 14237:2010

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